Process Engineering Support                        Contact Core Systems

Core Systems offers process engineering support as part of its comprehensive package of services.  Below is a sample of the services and applications available from Core Systems.

1. Implant Materials Characterization:

  • Rapid access to and assistance with materials characterization tools; SIMS, TXRF, ICPMS and others

2. Yield Support:

  • a) Assistance with DOE for implant or associated, pre/post implant processes
  • b) Assistance in yield difference determination for new vs. old or existing processes
  • c) Interface with Core’s sister company – Accurel, with support with TEM, FIB, etc.

3. New Product Development:

  • a) Implant recipe generation for new processes, including unique, alternate species.
  • b) Assistance with pre and post implant processes
  • c) High tilt implants, ULE (for USJ), wide ranges of energies, doses and species

4. Process Transfer Support:

  • Fab to fab (across the hall or US-Asia, Europe, etc) or Fab to foundry:
  • Includes SIMS match, contamination assessment and Rs match.

5. Fab Start-Ups:

  • Provide implant support for all doping and materials modification purposes while the new fab or group is starting a new product
  • Provide transitional support once the fab is ready with their own equipment
  • Provide selected equipment
  • Provide support for new equipment qualification
  • Provide full operation and maintenance support on site once the new equipment is on hand

6. Semiconductor Process Audit:

  • Core’s experienced process engineers will provide a full review – and characterization of implant process capability and stability
  • This audit can  include a determination, through the use of standard baseline implants and appropriate materials characterization, of how the customer’s implanter elemental contamination performance compares to similar implanter types and also by general product type (CMOS, Bipolar, etc.)

7.  Semiconductor Process Tool Correlation Studies

  • With a focus on implant, provide correlation of key implanter variables to device performance using a wide range of characterization tools.

8. Custom Ion Implant Training and Selected Process Engineering Seminars

  • Seminars are designed for small groups
    • a) Implantation Process Course – standard; 4 days (primarily for new process and maintenance engineers and a good review and update for experienced engineers) - Click here for course outline
    • b) Implanter Particle Control Course – 2 day - Click here for course outline
    • c) Implanter Contamination Control Course – 2 days (includes a brief overview of particles/FM)
    • d) Custom Implantation Course – a modified course as needed, based on experience and implanter type
    • e) High Tilt Implant Issues (4 hours) – Seminar Series 2
    • f) Implanter Materials Characterization (4 hours) – Seminar Series 4
    • g) Phosphorus Cross Contamination History and Control  (4 hours) – Seminar Series 5
    • h) Bulk and Surface Contamination in Ion Implantation – Measurement and Control (6 hours) – Seminar Series 8
    • i) General Implanter Overview for Process Engineers: 2 days
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