The ion implant bay is the most prolific unit process in the front end, with more wafer passes per ion implanter than any other equipment in the fab. If an implant system is down large numbers of lots are impacted with the potential for further bottle necks down stream.

The Krytek 300 is the only conditioner that simulates and conditions an ion source off-line as if it was in an implanter. It reduces fab line time required to bring up a source after exchange by 1-2 hours. This together with the elimination of infant mortality improves fab line productivity and availability. Payback can be expected in ~125 source changes.  With over 125 systems installed globally, the Krytek source conditioner has a proven track record of saving time and money.

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The Krytek 300 will increase implanter availability and overall productivity by:

• Reducing time required for ion source exchange by up to 90%
• Eliminating failure after source exchange (zero-hour sources)
• Eliminating premature source and other ion beam component failure due to rebuild errors

• Automated test and conditioning sequences recipe controlled
• Automated leak checking
• Electrical pre-testing of arc voltage, filament, TC’s & insulators
• Out-gassing of the filament and arc chamber
• Oxide burn-off and/or de-hydrolyzing
• End-point detection and auto shut-down
• Transport, Test and storage in vacuum canister
• Designed to take all Axcelis, Varian, AMAT and Nissin implant sources
• Throughput to handle needs of multiple implant systems