Core's Specialty Implant Service has over 20 years of technology development in the production of non-traditional and exotic ion species utilizing a variety of substrates. This includes a capability to implant into unusual and irregularly shaped substrates with over 70 different ion species.

Key Features & Capabilities:

• the ability fo implant from small samples up to 200 and 300 mm wafers with a wide range of ion species
• GaAs and other compound semiconductors are regularly implanted with 28Si, 29Si, Zn, Be, Mg, H, He, and O
• Implant Energies from 1 keV to 200 keV single charged
• Doubly charge species (for 400 keV) are routinely run
• High tilt angles to 89 degrees
• Low temperature implants to LN2 temperatures
• High temperature implants to 650 C and higher
• Process support for:  implant recipe generation, pre & post implant processing, and materials characterization

Dedicated Specialty Tools:

• Indium implantation tool for 200 and 300 mm wafers
• Germanium implantation expertise for  pre amorphization - 100 to 300 mm wafers
• Dopant-free System for 100 to 150 mm wafers
• Ample data demonstrating contamination control spanning 8 years
• Ideal for pre amorphization and radiation treatment implants
• Dedicated GaAs and other compound semiconductor wafer system
• Fast turnaround for 100 mm wafers
• Dedicated Helium and Hydrogen implantation systems

All Specialty implanters are calibrated to NIST traceable standards.

Standard turn around for Specialty implants is 3-5 days, but with advanced notice, same-day cycle time can be arranged.

Species Available to Implant

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