Our Sunnyvale, CA facility features more than 20 ion implanters operating 24 hours by 7 days a week. The production ion implant clean rooms consist of 2 bays, one for high current ion implanters and one for medium current ion implanters, each qualified to class 10 protocols with class 1 counts in the working areas. The newest additions to our stable of implanters are the state-of-the-art Axcelis MC3 tools implanting 200 and 300 mm wafers.
Our Sunnyval facility technology is targeted at serving ion implant requirements for 2 inch to 300mm wafers including: BiPolar and CMOS, GaAs and other compound semiconductor substrates, MEMS, LED's, silicon on insulator and other advanced applications.
Implant Process Capability
Recipe Category
Tool Type
Species
Energy, keV
Dose, ions/cm2
Notes
High Current
(Batch)
NV10-80's
B/BF2, P, As, H
10 - 80 keV
7E14 - 1E16+
NV10-160's
B/BF2, Al, (P*), As, Sb, H
10 - 160 keV
*Non-P tool available
Mid Current
(Serial)
MC3’s
B/BF2, P, As, In
5 - 750 keV
5E11 - 1E15
6200 series
B/BF2, P, As
10 - 200 keV
5E11 - 7E14
CF Series
4200 series
Non-dopants (Si, Ge)
10 – 200 keV
5E11 - 1E16
Notes:
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