ProfileCode is a PC-based software program which takes the guesswork out of ion implantation. It accurately calculates and plots ion implant concentration vs. depth profiles.
ProfileCode can model the implantation of elements with atomic numbers from 1 to 92 into any elemental, compound, or mixed substrate. An expandable and programmable library stores all elemental substrates and up to 100 of the most frequently used compound and mixed substrates for recall. ProfileCode easily calculates the depth profile for energies from 2 KeV to 5 MeV (50 MeV Gaussian) and any dose. Plot in a matter of seconds distribution profiles which take "Monte Carlo" style programs hours to complete. Perform multiple implants and sum any or all of the resulting profiles to achieve uniform distributions. Save costly implanter and analysis time by modeling implants first. ProfileCode output can be in the form of printed tabular data, an ASCII file, or presentation-ready graphics for printing on a dot matrix or laser printer.
Features
Skewed concentration profiles including:
- Gaussian
- Edgeworth
- Pearson
Uniform doping concentrations
Multiple implants (up to 10)
Multiple profile sums
Multi-layer modeling
Sputter loss compensation
Variable angle of incidence
Linear or logarithmic plots
Movable cursor with plot information display
Expandable and changeable data library
Elemental,compound, and mixed targets
Sheet Rho (for Si only)
Any dose
Energies from 2 KeV to 5 MeV
Monte Carlo plots in seconds not hours
Data, plot, or ASCII output
Presentation ready graphics
Thermal Diffusion Module
This allows the user to model the affect of a thermal anneal cycle on a given distribution profile. Anneal cycle ramp up, ramp down, and constant temperature segments are dictated by the user.
High Dose Module
The High Dose Module models the effect of changing substrate composition when implanting to high doses. Migration occurs more rapidly toward the surface due to radiation damage effects. A separate plot displays the target growth due to swelling.
