200 - 300mm
Wafer Implant CapabilityWith the addition of two new Axcelis MC3 Medium Current ion implanters, Core has the tools for large-scale production wafer implants. The MC3 tools feature: - Proven process capability from 5 - 750 keV
- Exceptional uniformity for Recipe Category high-tilt implants
- Exceptional beam purity throught the Angular Energy Filter
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Click to Enlarge |  Our Sunnyvale, CA facility features more than 20 ion implanters operating 24 hours by 7 days a week.The production ion implant clean rooms consist of 2 bays: one for high current ion implanters and one for medium current ion implanters. Each qualified to class 10 protocols with class 1 counts in the working areas. The newest additions to our stable of implanters are the state-of-the-art Axcelis MC3 tools implanting 200 and 300 mm wafers. Our technology is targeted at serving ion implant requirements for 2 inch to 300mm wafers including: BiPolar and CMOS, GaAs and other compound semiconductor substrates, MEMS, LED's, silicon on insulator and other advanced applications. Implant Process Capability| Recipe Category | Tool Type | Species | Energy, keV | Dose, ions/cm2 | Notes | High Current
(Batch) | NV10-80 series | Ar, As, B/BF2, C, F, Ge, H, He, N, O, P, Si | 10-80keV | 7E14 - 1E16+ | | | NV10-160 series | Ar, As, B/BF2, C, F, Ge, H, He, N, O, (P*), Si | 10-160keV | 7E14 - 1E16+ | * Non-P tool
available | Mid Current
(Serial) | MC3s | Ar, As, B/BF2, C, F, Ge, H, He, In, N, O, P, Si | 5-750keV | 5E11 - 1E15 | | | 6200 series | Ar, As, B/BF2, Cs, F, O, P , Si | 10 - 200 keV | 5E11 - 7E14 | | | CF Series | Ar, As, B/BF2, F, P | 10 - 200 keV | 5E11 - 7E14 | |
Notes: - The use of high current vs. mid current tools is loosely based on dose ranges.
Core can use a specified tool type for recipes upon request. - Exceptional uniformity for Recipe Category high-tilt implants.
- Very high doses (>5E16 ions/cm2) can be accommodated for special needs.
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