Review of the Cormap Optical Dosimetry System A review of the performance of an extended performance optical metrology system for ion beam dosimetry system with an energy range from 0.25eV to over 6MeV and a dose range of high E10 to E17 is presented. The dose sensitivity of the instrument over a dose range (E13 – High E16) averages > 0.7 and as high as 1.0+. An optical reflectivity model is presented describing the measurement technique and its response due to ion implant. 148KB
Advances in Optical Densitometry for Low Dose Measurements The move to sub 130nm devices has driven the need to have a wafer level, high sensitivity low dose mapping capability for all species on large diameter silicon wafers. Sheet resistance mapping systems do not provide the feature sensitivity and matching capability required for precision 1E11 to 1E13 doses. 284KB
